抗反射
AR / ITO sputtering rechnical specification
| Effe. coating area |
1800 x 2600 mm |
| Subs. size/Min. |
200 x 300 mm |
| Subs. size/Max. |
1100 x 1300 mm |
| Subs. thickness |
0.3 ~ 3.0 mm |
| SiOx film thickness |
20 ~ 200 nm |
| ITO film thickness |
6 ~ 50 nm |
| ITO sheet resistance |
40 ~ 1000W / |
| Reflection of AR film |
< 5.5% (single side) |
| Transmission of AR film |
>= 94% at (450~650nm) |